Adjustable Neutral Density Filter K&F Concept KF01.1401 58mm ND2–ND400 variable

Adjustable Neutral Density Filter K&F Concept KF01.1401 58mm ND2–ND400 reduces light transmission to enable longer exposures, motion blur and wider apertures in bright conditions. This 58 mm screw-in filter is suitable for stills and video and provides precise control over exposure without changing shutter speed or ISO.

Advantages

The K&F Concept KV34 Slim Filter offers a continuously variable attenuation from ND2 up to ND400, giving flexibility for different lighting situations. Constructed from optical glass with a double-sided multi-layer blue coating, it preserves image quality while providing water-resistant surface properties. Its slim 7.3 mm frame and super-light CNC aluminium ring minimize vignetting and reduce extra weight on the lens or tripod balance.

Suitable for

• Landscape photography requiring long exposures
• Creating water motion blur and silky waterfall effects
• Video work in bright light where controlled exposure is needed
• Portraits or scenes needing wider apertures in strong sunlight

Key specifications

• Manufacturer: K&F Concept
• Model / MPN: KF01.1401
• Thread / Diameter: 58 mm
• Density range: ND2 to ND400 (variable)
• Glass type: Optical glass with double-sided multi-layer blue coating
• Frame thickness: 7.3 mm

How to use

Screw the 58 mm filter onto a lens with a matching thread and rotate the outer ring to adjust the neutral density level between ND2 and ND400. Compose and meter the scene, then set shutter speed and aperture according to the desired exposure and creative effect. For long exposures use a tripod and remote release or self-timer to avoid camera shake. When using wide apertures check for any vignetting on wide-angle lenses and reduce density if needed.

Usage recommendations

Store the filter in a protective pouch when not in use and clean only with a blower, soft brush or microfiber cloth and appropriate lens fluid. Avoid cross-polarizing or stacking multiple variable ND filters to reduce the risk of uneven exposure or X-pattern artifacts at high densities.