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Polishing Pad RUBI 100 mm for Dry Polishing — RUBI 62977
Polishing Pad RUBI 100 mm for Dry Polishing — RUBI 62977
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Polishing Pad RUBI 100 mm for Dry Polishing — RUBI 62977
Leave your address - as soon as the price of the product goes down, you'll know about it right away
Polishing Pad RUBI 100 mm for Dry Polishing — RUBI 62977
Polishing Pad RUBI 100 mm for Dry Polishing — RUBI 62977
The RUBI polishing pad 100 mm for dry polishing is a compact accessory designed for refining and enhancing the surface finish of stone, ceramics and other finished materials. Made to fit standard 100 mm backing plates, this pad is intended for dry polishing applications with compatible polishers and angle grinders. It provides a controlled abrasive action to reduce fine surface imperfections and increase gloss without the need for liquids.
This 100 mm polishing pad offers consistent contact with flat and slightly contoured surfaces, enabling uniform polishing results. Its dry-use construction eliminates the need for water or cooling systems, simplifying setup and cleanup. The pad’s size and compatibility with standard backing plates make it easy to mount and replace, while its design supports both professional restoration tasks and home DIY maintenance.
Attach the polishing pad securely to a compatible 100 mm backing plate following the polisher manufacturer’s mounting instructions. Start polishing at low speed to establish contact, then adjust speed and pressure according to the material and desired finish. Move the tool in steady, overlapping passes to avoid concentrating heat in one spot. Inspect the surface periodically and replace the pad when wear affects performance.
Use appropriate personal protective equipment, including eye protection and a dust mask, when performing dry polishing. Avoid excessive pressure and prolonged dwell time in one area to prevent surface damage. For larger surfaces or heavy material removal, consider using progressive grit steps and specialized wet polishing pads if recommended for the specific material.
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